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LPP EUV Source Readiness for NXE 3300B

David C. Brandt,Igor V. Fomenkov,Nigel R. Farrar,Bruno La Fontaine,David W. Myers,Daniel J. Brown,Alex I. Ershov,Norbert R. Bowering,Daniel J. Riggs,Robert J. Rafac,Silvia De Dea,Rudy Peeters,Hans Meiling,Noreen Harned,Daniel Smith,Alberto Pirati,Robert Kazinczi

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE（2014）

Cited 14|Views76

Key words

EUV source,EUV lithography,Laser Produced Plasma,Collector,Droplet Generator

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