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Use of Supramolecular Assemblies As Lithographic Resists

Scott M. Lewis,Antonio Fernandez,Guy A. DeRose,Matthew S. Hunt,George F. S. Whitehead,Agnese Lagzda,Hayden R. Alty,Jesus Ferrando-Soria,Sarah Varey,Andreas K. Kostopoulos,Fredrik Schedin,Christopher A. Muryn,Grigore A. Timco,Axel Scherer,Stephen G. Yeates,Richard E. P. Winpenny

ANGEWANDTE CHEMIE-INTERNATIONAL EDITION（2017）

引用 18|浏览29
关键词
heterometallic compounds,lithography,supramolecular assembly,resist materials
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