EUV Computational Lithography Using Accelerated Topographic Mask Simulation

Vitaly Domnenko,Bernd Kuechler,Wolfgang Hoppe, Juergen Preuninger,Ulrich Klostermann,Wolfgang Demmerle,Martin Bohn, Dietmar Krueger,Ryan Ryoung Han Kim,Ling Ee Tan

DESIGN-PROCESS-TECHNOLOGY CO-OPTIMIZATION FOR MANUFACTURABILITY XIII（2019）

引用 13|浏览9

关键词

EUV,3D mask,computational lithography,photomasks,mask topography effects,early design exploration,verification,correction,EPE,focus shift,pattern shift

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