Line Edge Roughness Reduction for EUV Self-Aligned Double Patterning by Surface Modification on Spin-on-carbon and Tone Inversion Technique
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3（2021）
Key words
line edge roughness,line width roughness,space width roughness,extreme ultra-violet,self-aligned double patterning,tone inversion,surface treatment,fluorocarbon,direct current superposition,trimethylsilane dimethylamine,edge-placement error
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