Stochastic Modeling and Local CD Uniformity Comparison Between Negative Metal-Based, Negative- and Positive-Tone Development EUV Resists.
IEICE Transactions on Electronics（2021）
Key words
stochastic model calibration,LCDU,metal-oxide-resist,polymer,mask tone,resist,EUV,NTD
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined