Chrome Extension
WeChat Mini Program
Use on ChatGLM
VIPCreated with Sketch.

Synthesis of End-Cap Enabled Self-Immolative Photoresists for Extreme Ultraviolet Lithography

Jingyuan Deng,Sean Bailey, Ruiwen Ai, Anthony Delmonico,Gregory Denbeaux,Shaoyi Jiang,Christopher K. Ober

ACS Macro Letters（2022）

Cited 9|Views27
Key words
Extreme Ultraviolet Lithography,Chemically Amplified Resists,Electron Beam Lithography
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined