Understanding the Onset of EUV Resist Chemical Stochastics

Greg Denbeaux, Nabihah Azhari, Ruiwen Ai, Benjamin Kahl, Micah Painter, Zachary Adamson, Ashley Aldrin, Eshan Dilina, Ankit Choudhary,Robert L. Brainard

JAPANESE JOURNAL OF APPLIED PHYSICS（2023）

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Key words

extreme ultraviolet,EUV,resist stochastics,segregation

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