High Power Sunlight-Simulated UV-Induced Radical Polymerization: Self-Initiation and Self-Crosslinking

Under high power UV irradiation, radicals can be generated from double bonds through photodissociation, H-abstraction, or oxygen initiation mechanisms. This eliminates the need for externally added initiators in photopolymerization. This study investigates high-power sunlight-simulated UV-induced free radical polymerization under various experimental conditions, including the presence of inhibitors, open or closed systems, and partial degassing. Additionally, high-power sunlight-simulated UV-induced atom transfer radical polymerization is explored by externally adding CuBr2/ligand (1:2) catalyst at 100 or 1000 ppm molar concentration of copper. Delicate fabrication of real-world thin films, coatings, and delicate 3D composites further demonstrates the high reliability and versatility of this technology. A synthesis of polymeric materials and their coatings in the absence of any added initiator. By applying high power sunlight-simulated UV-induced free radical and atom transfer radical polymerization-based radical polymerization, thin films, coatings, and delicate 3D composites can be synthesized and crosslinked without any added initiators.image