Uniformity Improvement of Josephson Junction Resistance by Considering Al Deposition on a Resist Sidewall for Large-scale Integration of Qubits

Tsuyoshi Takahashi, Norinao Kouma,Yoshiyasu Doi,Shintaro Sato,Shuhei Tamate, Y. Nakamura

openalex(2022)

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摘要
2022 International Conference on Solid State Devices and Materials ,Uniformity Improvement of Josephson Junction Resistance by Considering Al Deposition on a Resist Sidewall for Large-scale Integration of Qubits
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